EMRC Gas Flow Monitor for Emissions Compliance and Process Performance Monitoring
The EMRC Gas Flow Monitoring System measures gas flow in a plant stack or gas stream.
It is designed for , a corrosive environment, and a nominal particulate loading.
In addition, the techniques employed meet regulathigh temperatures (~1,500-2,000°F)ory (EPA and State) measurement criteria.
Gas Flow The gas flow system consists of an “insitu” S-type pitot located at a representative location in the stack or duct.
(Representative siting is determined by taking a gas flow profile during normal operations.)
The resultant dynamic pressure (Delta P "H20) is transmitted via open tubes to an instrument enclosure located on site or at another report location (up to ~1,000 ft.).
Each open tube is directly connected to a signal conditioning module (chemical-mechanical adsorption and damping).
After signal conditioning the gas flow signal is channeled to the signal transducer module.
The signal transducer produces a DC output which is routed to an electronic conditioner and interface.
• High Temperature Range (~1,500-2,000°F) • Suitable for corrosive environments • Insitu S-type Pitots
Weight: Wall mount approx. 160-190 lbs. 19″ rack mount approx 70 lbs.
Power: 115v or 220v Operating Cabinet
Temperature: 30° – 120°F (Some units have internal heaters)
Probe Temperature: ~2000° F (functional limit of probe material)
Recorder Outputs: 4-20 ma standard, all others upon request
Performance Specifications Sensitivity: ~2fps
Response Time: ~1-2 seconds to 100% of final reading
Linearity: +/- 2% of full scale
Repeatability: < 1 % Zero Drift: ~2-3% of full scale Span Drift: ~2-3% of full scale
Accuracy: ~2% of full scale
On-Site Maintenance & Field Services AMP-Cherokee offers total coverage of warranty repairs and ongoing maintenance. Our service include: Factory Warranty Repairs 27x7 Emergency Response Scheduled Maintenance Parts and On-site Repairs
Contact AMP-Cherokee today at 800.399.4236 or email@example.com for a free consultation on your opacity compliance monitoring and process performance needs.